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Updated 10 August 2010 Updated monthly, each list includes a cross-disciplinary sampling of the most frequently downloaded papers from SPIE Conference Proceedings and SPIE Journal papers. Each title is linked to the abstract page for that paper on the SPIE Digital Library. Astronomy: Survey of cost models for space telescopes (Optical Engineering) Biomedical Optics & Medical Imaging: Laser speckle contrast imaging in biomedical optics (J. Biomedical Optics) Defense & Security: Advancement in 17-micron pixel pitch uncooled focal plane arrays (Proceedings of SPIE) Electronic Imaging & Signal Processing: Object tracking using an adaptive Kalman filter combined with mean shift (Optical Engineering) Illumination & Displays: Free-form reflector optimization for general lighting (Optical Engineering) Industrial Sensing & Measurement: Overview of three-dimensional shape measurement using optical methods (Optical Engineering) Lasers & Sources: Laser source for DIRCM at CILAS (Proceedings of SPIE) Micro/Nano Lithography: Monte Carlo modeling in the low-energy domain of the secondary electron emission of polymethylmethacrylate for critical-dimension scanning electron microscopy (J. Micro/Nanolithography, MEMS, and MOEMS) Nanotechnology: Optical manipulation of nanoparticles: a review (J. Nanophotonics) Optical Design & Engineering: Edge tool influence function library using the parametric edge model for computer controlled optical surfacing (Proceedings of SPIE) Optoelectronics & Communications: InAs/GaSb type II superlattices for advanced 2nd and 3rd generation detectors (Proceedings of SPIE) Remote Sensing: Unmanned aerial vehicle-based remote sensing for rangeland assessment, monitoring, and management (J. Applied Remote Sensing) Solar & Alternative Energy: Nanostructured photovoltaics for space power (J. Nanophotonics) Astronomy Biomedical Optics & Medical Imaging Electronic Imaging & Signal Processing Illumination & Displays Industrial Sensing & Measurement - 22-nm-node technology active-layer patterning for planar transistor devices (J. Micro/Nanolithography, MEMS, and MOEMS)
- Advances in roll-to-roll imprint lithography for display applications (Proceedings of SPIE)
- Double-patterning requirements for optical lithography and prospects for optical extension without double patterning(J. Micro/Nanolithography, MEMS, and MOEMS)
- EUV into production with ASML's NXE platform (Proceedings of SPIE)
- EUV lithography at the 22nm technology node (Proceedings of SPIE)
- Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners (Proceedings of SPIE)
- Hybrid energy harvester based on piezoelectric and electromagnetic mechanisms(J. Micro/Nanolithography, MEMS, and MOEMS)
- Monte Carlo modeling in the low-energy domain of the secondary electron emission of polymethylmethacrylate for critical-dimension scanning electron microscopy(J. Micro/Nanolithography, MEMS, and MOEMS)
- Optics for EUV production (Proceedings of SPIE)
- Thin-absorber extreme-ultraviolet lithography mask with light-shield border for full-field scanner: flatness and image placement change through mask process (J. Micro/Nanolithography, MEMS, and MOEMS)
Optical Design & Engineering Optoelectronics & Communications Solar & Alternative Energy
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